q to manage “EUV” masks and “EUV” reticles designed for integrated circuits, not specified by 3B001.g, and using a mask “substrate blank” specified by 3B001.j.” A technical Notice is extra to explain that masks or reticles by using a mounted pellicle are considered masks and reticles. Aidez-nous à protéger Glassdoor en confirmant q… Read More